Laboratory 1 - Synthesis, Processing, Functionalization.
The mission of the laboratory is to facilitate the technological transfer of research results and laboratory technologies developed in INFLPR based on the concept of "scaling-up approach" and to provide synthesis, processing and functionalization services to potential economic partners or interested institutions.
Thin film synthesis services by PLD and Magnetron sputtering on large surfaces (up to 8 ”).- Plasma processing at atmospheric pressure of various surfaces.
- Production of transparent ceramics for active laser media, various advanced materials and nanomaterials.
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Joining Chemical Pressure and Epitaxial Strain to Yield Y-doped BiFeO3 Thin Films with High Dielectric Response N. D. Scarisoreanu et al, Scientific Reports (2016) |
Large equipment / institutional facilities:
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Thin film deposition systems on large areas > 200 mm.
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Robotic surface processing equipment with atmospheric pressure plasma.
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Ultrashort pulse laser (CEP, 25 fs, 1 mJ, 1 kHZ, high contrast).
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Cold isostatic press.
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Hot isostatic press.
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Oven 1800 C.
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Oven 1800 C - oxygen.
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Oven 3,000 ° C (vacuum, H2, inert gases)
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Rolling dopant and strain in Y-doped BiFeO3 epitaxial thin films for photoelectrochemical water splitting F. Haydous et al, Scientific Reports (2018) |
Equipment specifications
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Pulsed Laser Deposition system (200 mm / 8 ") SMP 800 Platform
- Excimer laser included
- Up to 4 integrated targets (minimum 3 targets)
- Up to 200 mm deposition surface
- Deposition temperature of substrate: room temperature - up to 800⁰C
responsible staff - Nicu Scarisoreanu
users - Florin Andrei
- Ultrashort pulse laser
- Carrier envelope phase stabilization
- Pulse 25 fs
- Energy 1 mJ
- Frequency 1 kHZ
- High contrast
responsible staff - Nicu Scarisoreanu
users -
- Cold isostatic press
responsible staff - Florin Andrei
users - George Stanciu
- 1800°C Furnace
responsible staff - Florin Andrei
users - George Stanciu
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1800°C Furnace in oxygen medium
responsible staff - Florin Andrei
users - George Stanciu
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3,000°C Furnace in vacuum, H2, inert gases
responsible staff - Florin Andrei
users - George Stanciu
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Magnetron sputtering (200 mm / 8 ") with e-beam evaporation, dual plasma source at atmospheric pressure
- 4 magnetron guns of 3” diameter, 2 alternative guns of 2”
- 4-port e-beam source
- Up to 200 mm deposition surface
- Residual gas analyser operating at process pressures
- Thin film thickness monitoring
responsible staff - Bogdana Mitu
users - Nicu Scarisoreanu
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Hot isostatic press
responsible staff - Florin Andrei
users - George Stanciu
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Robotic surface processing equipment with atmospheric pressure plasma
- Jet type plasma source with atmospheric pressure operation, powered by high power and frequency generator (~ 5 kW)
- Working gases: nitrogen, air, possibility of reactive gas introduction, gas mixtures and precursor injection system
- Robotic system for deposits up to 50 cm in one direction and robotic arm for 3D material processing
- Surface treatment / deposition speed up to 20 m/min
responsible staff - Bogdana Mitu
users -
Laboratory Team
Responsible of Laboratory
Dr. Nicu Doinel Scarisoreanu - CS1
Dr. Bogdana Mitu - CS1
Drd. Florin Andrei - ACS
Research and development activity
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Synthesis of large area coatings / thin films of advanced oxide, oxynitric and metallic materials for operation in extreme conditions (ITER, ELI, CETAL), dielectric and metallic coatings and films for CETAL and ELI facilities.
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Synthesis of transparent ceramics
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Large area coatings of nanocomposite materials for biological and biomedical applications
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Production of nanomaterials and nanostructures for energy and ecotechnologies (photocatalysis, energy harvesting, photovoltaics, batteries).
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Production of multicomponent or multilayer thin films for electronic devices and new materials applied on a large area for applications in sensors.
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Surface treatments
National and international novelty degree: industrial standard deposition systems on 8-inch supports.