Laboratory 1 - Synthesis, Processing, Functionalization.


  The mission of the laboratory is to facilitate the technological transfer of research results and laboratory technologies developed in INFLPR based on the concept of "scaling-up approach" and to provide synthesis, processing and functionalization services to potential economic partners or interested institutions.


  • L1P1Thin film synthesis services by PLD and Magnetron sputtering on large surfaces (up to 8 ”).
  • Plasma processing at atmospheric pressure of various surfaces.
  • Production of transparent ceramics for active laser media, various advanced materials and nanomaterials.







Joining Chemical Pressure and Epitaxial Strain to Yield Y-doped BiFeO3 Thin Films with High Dielectric Response N. D. Scarisoreanu et al, Scientific Reports (2016)




Interconnectivity with existing laboratories L1


Large equipment / institutional facilities:

  • Thin film deposition systems on large areas > 200 mm.

  • Robotic surface processing equipment with atmospheric pressure plasma.

  • Ultrashort pulse laser (CEP, 25 fs, 1 mJ, 1 kHZ, high contrast).

  • Cold isostatic press.

  • Hot isostatic press.L1P2

  • Oven 1800 C.

  • Oven 1800 C - oxygen.

  • Oven 3,000 ° C (vacuum, H2, inert gases)





Rolling dopant and strain in Y-doped BiFeO3 epitaxial thin films for photoelectrochemical water splitting

F. Haydous et al, Scientific Reports (2018)





   Purchased equipment;

  • Pulsed Laser Deposition system (200 mm / 8 ") SMP 800 Platform        

          - Excimer laser included

          - Up to 4 integrated targets (minimum 3 targets)

          - Up to 200 mm deposition surface

          - Deposition temperature of substrate:  room temperature - up to 800⁰C


          responsible staff - Andreea Andrei

          users - Florin Andrei



  • Ultrashort pulse laserL1P3

          - Carrier envelope phase stabilization

          - Pulse 25 fs

          - Energy 1 mJ

          - Frequency 1 kHZ

          - High contrast


          responsible staff - 

          users - 



  • Cold isostatic press


          responsible staff - Florin Andrei

          users - George Stanciu



  • 1800°C Oven


          responsible staff - Florin Andrei

          users - George Stanciu



  • 1800°C Oven in oxygen medium


          responsible staff - Florin Andrei

          users - George Stanciu



  • 3,000°C Oven in vacuum, H2, inert gases


          responsible staff - Florin Andrei

          users - George Stanciu


In purchase equipment;


  • Magnetron sputtering (200 mm / 8 ") with e-beam evaporation, dual plasma source at atmospheric pressure

          - 4 magnetron cannons

          - 4-port e-beam source

          - Up to 200 mm deposition surface

          - Waste gas analyzer

          - Thin film thickness monitoring


          responsible staff - Bogdana Mitu

          users - Nicu Scarisoreanu


  • Hot isostatic press


          responsible staff - Florin Andrei

          users - George Stanciu


  • Robotic surface processing equipment with atmospheric pressure plasma

          - Jet type plasma source with atmospheric pressure operation, powered by high power and frequency generator (~ 5 kW)

          - Working gases: nitrogen, air, possibility of reactive gas introduction, gas mixtures and precursor injection system

          - Robotic system for deposits up to 50 cm in one direction and robotic arm for 3D material processing

          - Surface treatment / deposition speed up to 20 m/min


          responsible staff - Bogdana Mitu

          users - 

Laboratory Team 



   Responsible of LaboratoryL1NScarisoreanu



    Dr. Nicu Doinel Scarisoreanu - CS1






    Dr. Bogdana Mitu - CS1







    Dr. Andreea Andrei - CS3







    Drd. Florin Andrei - ACS


Research and development activity


  • Synthesis of large area coatings / thin films of advanced oxide, oxynitric and metallic materials for operation in extreme conditions (ITER, ELI, CETAL), dielectric and metallic coatings and films for CETAL and ELI facilities.

  • Synthesis of transparent ceramics

  • Large area coatings of nanocomposite materials for biological and biomedical applications

  • Production of nanomaterials and nanostructures for energy and ecotechnologies (photocatalysis, energy harvesting, photovoltaics, batteries).

  • Production of multicomponent or multilayer thin films for electronic devices and new materials applied on a large area for applications in sensors.

  • Surface treatments


               National and international novelty degree: industrial standard deposition systems on 8-inch supports.